Electrical characterization of ISFETs

Authors

  • Daniel Tomaszewski Institute of Electron Technology, Warsaw, Poland
  • Chia-Ming Yang Chang Gung University image/svg+xml
  • Bohdan Jaroszewicz Institute of Electron Technology, Warsaw, Poland
  • Michał Zaborowski Institute of Electron Technology, Warsaw, Poland
  • Piotr Grabiec Institute of Electron Technology, Warsaw, Poland
  • Dorota G. Pijanowska Polish Academy of Sciences image/svg+xml

DOI:

https://doi.org/10.26636/jtit.2007.3.830

Keywords:

ISFET, CMOS, electrical measurements, I-V characteristics, characterization, parameters extraction

Abstract

Methodology of electrical characterization of ISFETs has been described. It is based on a three-stage approach. First, electrical measurements of ISFET-like MOSFETs and extraction of basic parameters of the MOSFET compact model are performed. Next, mapping of the ISFET channel conductances and a number of other characteristic parameters is carried out using a semi-automatic testing setup. Finally, ISFET sensitivity to solution pH is evaluated. The methodology is applied to characterize ISFETs fabricated in the Institute of Electron Technology (IET).

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References

[1] P. Bergveld, "Thirty years of ISFETOLOGY. What happened in the past 30 years and what may happen in the next 30 years", Sens. Actuat. B, vol. 88, pp. 1-20, 2003.
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[2] P. Bergveld, "ISFET, theory and practice", in IEEE Int. Conf. Sens., Toronto, Canada, 2003.
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[3] N. Arora, MOSFET Models for VLSI Circuit Simulation. Theory and Practice. Wien: Springer-Verlag, 1995.
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Submitted

2023-06-25

Published

2007-09-30

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Section

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How to Cite

[1]
D. Tomaszewski, C.-M. Yang, B. Jaroszewicz, M. Zaborowski, P. Grabiec, and D. G. Pijanowska, “Electrical characterization of ISFETs”, JTIT, vol. 29, no. 3, pp. 55–60, Sep. 2007, doi: 10.26636/jtit.2007.3.830.

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