GRABOWSKI, Jarosław; B. BECK, Romuald. Oxidation kinetics of silicon strained by silicon germanium. Journal of Telecommunications and Information Technology, Warsaw, Poland, v. 29, n. 3, p. 30–32, 2007. DOI: 10.26636/jtit.2007.3.824. Disponível em: https://www.jtit.pl/jtit/article/view/824. Acesso em: 9 jul. 2026.