NAZAROV, Alexei N.; KILCHYTSKA, V. I.; VOVK, Ja. N.; COLINGE, J. P. High-temperature instability processes in SOI structures and MOSFETs. Journal of Telecommunications and Information Technology, [S. l.], v. 3, n. 1, p. 18–26, 2001. DOI: 10.26636/jtit.2001.1.47. Disponível em: https://www.jtit.pl/jtit/article/view/47. Acesso em: 17 sep. 2025.