KALISZ, Małgorzata; B. BECK, Romuald; BARCZ, Adam; ĆWIL, Michał. The role of fluorine-containing ultra-thin layer in controlling boron thermal diffusion into silicon. Journal of Telecommunications and Information Technology, Warsaw, Poland, v. 29, n. 3, p. 25–29, 2007. DOI: 10.26636/jtit.2007.3.823. Disponível em: https://www.jtit.pl/jtit/article/view/823. Acesso em: 10 jul. 2026.