SCHWALKE, Udo. Gate dielectrics: process integration issues and electrical properties. Journal of Telecommunications and Information Technology, Warsaw, Poland, v. 19, n. 1, p. 7–10, 2005. DOI: 10.26636/jtit.2005.1.298. Disponível em: https://www.jtit.pl/jtit/article/view/298. Acesso em: 4 aug. 2026.